Design Leader at MAPPER Lithography
Taiwan
Design Leader at MAPPER Lithography
Taiwan
(Privately Held; Semiconductors industry)
July 2009 — Present (1 month)
(Public Company; ASML; Semiconductors industry)
April 2009 — June 2009 (3 months)
Getting the next generation TWINSCAN systems ready for market.
(Public Company; ASML; Semiconductors industry)
April 2004 — March 2009 (5 years)
Customer support for Metrology, Sensors and Software of lithographic equipment for microchip manufacturing ('scanners').
- 2007-2009: Taipei-based
- 2006 Taichung-based
- 2004-2005: Hsinchu-based
(Public Company; 501-1000 employees; ASML; Semiconductors industry)
May 1998 — March 2004 (5 years 11 months)
Designer and software architect for the TWINSCAN product family: high-end lithography equipment for 300mm wafer size. Main focus on equipment-based metrology, automation and productivity.
ir. / M.Sc. , Computer Science , 1990 — 1997
Patent USPTO 11/170,739 "A system and method of monitoring and diagnosing system condition and performance."
Patent USPTO-20040189967 "Method of manufacturing a device, device manufactured thereby, computer program and lithographic apparatus."
"Academy Award 1996" in the category Education from Eindhoven University of Technology