The Vistec Electron Beam Lithography Group is a world leader in the design and manufacture of electron beam lithography systems.
The Group provides leading edge technology solutions for all areas of advanced electron-beam lithography. The application areas span a wide range of existing and emerging semiconductor and nanotechnology applications including silicon direct write, compound semiconductor, mask making, advanced research, integrated optics and several new emerging markets.
In addition to their production facilities in Germany and the US, the Group also maintains service and support centres in the USA, Europe, China, Japan, Taiwan and Korea.
Operating under the umbrella of the Vistec Electron Beam Lithography Group the latter consists of two business units: Vistec Electron Beam GmbH, which produces Variable Shaped Beam Lithography systems– located in Jena, Germany and Vistec Lithography Inc., manufacturing Gaussian Beam Lithography systems – located in Watervliet, NY, USA.